The key to improving and enhancing the polishing performance of abrasives is to suppress physical agglomeration.
By suppressing the physical aggregation between particles such as ceria, zirconia, alumina, and GC, it leads to stability in performance and reduces scratches.
Microparticles such as precision abrasives (abrasives) may physically aggregate in water due to intermolecular forces and charging effects. This aggregation can lead to the formation of coarse abrasive particles, which may cause scratches, scuffs, and changes in concentration. To prevent this physical aggregation, one method is to coat each particle (abrasive grain) to prevent physical aggregation between particles. By using coatings to prevent physical aggregation, it can also lead to improved dispersion of slurries, suppressing the aggregation and adsorption between particles. Please try the additive "EVERFLO," which is expected to improve and enhance polishing performance simply by mixing it into polishing slurries. Expected effects from the addition of EVERFLO: - Improved dispersion - Suppression of scratches and scuffs - Increased lifespan (stabilization of polishing ability) - Improved cleanability *Note* When used in silica slurries, there is a possibility of gelation, so please confirm in advance whether gelation occurs.
- Company：八千代マイクロサイエンス
- Price：Other
